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Deposition of HfO2 thin films on ZnS substrates by Qi He; Hui-bin Guo; Jun-jun Wei; S.J Askari; Hong-bin Wang; Shu-yu Zhang; Hai Yang; Xiao-ping Su; Fan-xiu Lu is a Engineering article available to read on EtoBox.
What is Deposition of HfO2 thin films on ZnS substrates about?
HfO 2 thin films with columnar microstructure were deposited directly on ZnS substrates by electron beam evaporation process. SiO 2 thin films, deposited by reactive magnetron sputtering, were used as buffer layers, HfO 2 thin films of granular microstructure were obtained on SiO 2 interlayer by this process. X-ray diffraction patterns demonstrate that the as-deposited HfO 2 films are in an amorphous-like state with small amount of crystalline phase while the HfO 2 films annealed at 450 °C in O 2 for 30 min and in Ar for 150 min underwent a phase transformation from amorphous-like to monoclinic phase. Antireflection effect in certain infrared wave band, such as 3-6 μm, 4-12 μm, 4-8 μm and 3-10 μm, can be observed, which was dependent on the thickness of thin films. The cross-sectional images of HfO 2 films, obtained by field emission scanning electron microscopy, revealed that there was no distinct morphological change upon annealing.
Who reads Deposition of HfO2 thin films on ZnS substrates?
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Qi He; Hui-bin Guo; Jun-jun Wei; S.J Askari; Hong-bin Wang; Shu-yu Zhang; Hai Yang; Xiao-ping Su; Fan-xiu Lu
- Publisher
- Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)
- Published
- 2008
- Language
- EN
- Field
- Engineering (Physical Sciences)