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Radiofrequency ion beam source RIM-IO for material processing by J. Freisinger; H. Loeb; A. Scharmann is a Engineering article available to read on EtoBox.

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## Radiofrequency ion beam source RIM-IO for material processing Based on more than 25 years of experience, which have been gained with numerous rf ion thrusters and rf particle injectors and with some precursory experiments, 10-cm diameter rf ion beam generators RIM-10for material processing were built and successfully tested. They work with an electrodeless, inductively coupled rf discharge and a three-grid accelerator. Performance mapping shows ion currents up to 300 mA with ion energiesfrom 200 eV to 3.5 keV at about 1 W/mA ofspecific power consumption and 0.03 cm?/min gasflow rate (standard temperature and pressure) per mA. In general, 10-cm rf ion sources have been operated at Gießen with 15 different gases. Owing to the absence ofanyfilaments, the RIM-10 generator is well suitedfor reactive gases as oxygen or chlorinated and fluorinated hydrocarbons. Die Hochfrequenz-Ionenstrahlquelle RIM-10 für Materialbearbeitung. Aufgrund mehr als 25jähriger Erfahrungen mit zahlreichen Hf-Ionentriebwerken und Hf-Neutralteilchen-Injektoren sowie mit einigen Vorläuferexperimenten konnten jetzt 10-cm-Hf-Ionenstrahlgeräte RIM-10 zur Materialbearbeitung gebaut und erfolgreich getestet werden.

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Author

J. Freisinger; H. Loeb; A. Scharmann

Publisher

Walter de Gruyter GmbH

Published

1987

Language

EN

Field

Engineering (Physical Sciences)