About this scholarly article

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - An in-line image quality monitoring system for imaging device fabrication using automated macro-inspection by Sasaki, Tohru; Archie, Chas N.; Hikichi, Kunihiko; Sugimoto, Dai; Izumi, Nozomu; Uda, Mitsuru; Kohayase, Atsushi; Yamashita, Hiroshi is a scholarly article available to read on EtoBox.

Author

Sasaki, Tohru; Archie, Chas N.; Hikichi, Kunihiko; Sugimoto, Dai; Izumi, Nozomu; Uda, Mitsuru; Kohayase, Atsushi; Yamashita, Hiroshi

Publisher

SPIE

Published

2006

Language

EN