About this scholarly article

Highly Selective Etching of SnO2 Absorber in Binary Mask Structure for Extreme Ultra-Violet Lithography by Lee, Soo Jin (author);Jung, Chang Yong (author);Park, Sung Jin (author);Hwangbo, Chang Kweun (author);Seo, Hwan Seok (author);Kim, Sung Soo (author);Lee, Nae Eung (author) is a scholarly article available to read on EtoBox.

Author

Lee, Soo Jin (author);Jung, Chang Yong (author);Park, Sung Jin (author);Hwangbo, Chang Kweun (author);Seo, Hwan Seok (author);Kim, Sung Soo (author);Lee, Nae Eung (author)

Publisher

American Scientific Publishers (ISSN 1533-4880)

Published

2012