About this scholarly article

Chemisorption and thermally activated etching of Si(100)-2×1 by iodine by Rioux, D.; Stepniak, F.; Pechman, R. J.; Weaver, J. H. is a scholarly article available to read on EtoBox.

Author

Rioux, D.; Stepniak, F.; Pechman, R. J.; Weaver, J. H.

Publisher

The American Physical Society; American Physical Society; Springer Verlag; American Physical Society (APS) (ISSN 1098-0121)

Published

1995

Language

EN