About this Engineering article
Characteristics of an Amorphous Carbon Layer as a Diffusion Barrier for an Advanced Copper Interconnect by An, Byeong-Seon; Kwon, Yena; Oh, Jin-Su; Lee, Changmin; Choi, Seongheum; Kim, Hyoungsub; Lee, Miji; Pae, Sangwoo; Yang, Cheol-Woong is a Engineering article available to read on EtoBox.
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- Author
- An, Byeong-Seon; Kwon, Yena; Oh, Jin-Su; Lee, Changmin; Choi, Seongheum; Kim, Hyoungsub; Lee, Miji; Pae, Sangwoo; Yang, Cheol-Woong
- Publisher
- American Chemical Society; American Chemical Society (ACS) (ISSN 1944-8244)
- Published
- 2019
- Field
- Engineering (Physical Sciences)