About this scholarly article

SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Double exposure technique for 45nm node and beyond by Hsu, Stephen; Weed, J. Tracy; Martin, Patrick M.; Park, Jungchul; Van Den Broeke, Douglas; Chen, J. Fung is a scholarly article available to read on EtoBox.

Author

Hsu, Stephen; Weed, J. Tracy; Martin, Patrick M.; Park, Jungchul; Van Den Broeke, Douglas; Chen, J. Fung

Publisher

SPIE

Published

2005