Opening book details…
About this Engineering article
Degradation Behavior and Mechanism of Polymer Films for High-ohmic Resistor Protection in a Heat and Humid Environment by Wang, X.Y.; Zhang, H.; Ma, X.P.; Cheng, Q.; Li, C.G.; Li, M.X.; Chen, T.N.; Zhang, P.; Shao, J.Q. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Wang, X.Y.; Zhang, H.; Ma, X.P.; Cheng, Q.; Li, C.G.; Li, M.X.; Chen, T.N.; Zhang, P.; Shao, J.Q.
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0026-2714)
- Published
- 2016
- Field
- Engineering (Physical Sciences)