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About this Engineering article
Atomistic simulation of SiH interactions with silicon surfaces during deposition from silane containing plasmas by S. Ramalingam; D. Maroudas; E. S. Aydil is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- S. Ramalingam; D. Maroudas; E. S. Aydil
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 1998
- Field
- Engineering (Physical Sciences)