About this scholarly article

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Application of through-focus focus-metric analysis in high resolution optical metrology by Attota, Ravikiran; Silver, Richard M.; Silver, Richard M.; Germer, Thomas A.; Bishop, Michael; Larrabee, Robert; Stocker, Michael T.; Howard, Lowel is a scholarly article available to read on EtoBox.

Author

Attota, Ravikiran; Silver, Richard M.; Silver, Richard M.; Germer, Thomas A.; Bishop, Michael; Larrabee, Robert; Stocker, Michael T.; Howard, Lowel

Publisher

SPIE

Published

2005