About this Engineering article
Positive deep UV resist based on poly(.ALPHA.-acetoxystyrene). by ITO, HIROSHI; UEDA, MITSURU; ITO, TAKASHI is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- ITO, HIROSHI; UEDA, MITSURU; ITO, TAKASHI
- Publisher
- Japan Science and Technology Information Aggregator, Electronic; The Technical Association of Photopolymers, Japan; Technical Association of Photopolymers; Technical Association of Photopolymers, Japan (ISSN 0914-9244)
- Published
- 1990
- Field
- Engineering (Physical Sciences)