Opening book details…
About this scholarly article
International Conference on Advanced Nanomaterials & Emerging Engineering Technologies - Numerical simulation of dry and wet oxidation of Silicon by TCAD Sprocess by Anusha, A; Parameswaran, Chithra; Revathi, P; Velmurugan, V. is a scholarly article available to read on EtoBox.
- Author
- Anusha, A; Parameswaran, Chithra; Revathi, P; Velmurugan, V.
- Publisher
- IEEE
- Published
- 2013
More by Anusha, A; Parameswaran, Chithra; Revathi, P; Velmurugan, V.
Browse all works by Anusha, A; Parameswaran, Chithra; Revathi, P; Velmurugan, V.