About this scholarly article

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 19 September 2011)] Photomask Technology 2011 - The trouble starts with using electrons: putting charging effect correction models to the test by Wandel, Timo; Maurer, Wilhelm; Abboud, Frank E.; Utzny, Clemens; Nakayamada, Noriaki is a scholarly article available to read on EtoBox.

Author

Wandel, Timo; Maurer, Wilhelm; Abboud, Frank E.; Utzny, Clemens; Nakayamada, Noriaki

Publisher

SPIE

Published

2011

Language

EN