Opening book details…
About this Engineering article
Numerical Simulation Method for Plasma-Induced Damage Profile in SiO$_{2}$ Etching by Kuboi, Nobuyuki; Tatsumi, Tetsuya; Kobayashi, Shoji; Komachi, Jun; Fukasawa, Masanaga; Kinoshita, Takashi; Ansai, Hisahiro is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Kuboi, Nobuyuki; Tatsumi, Tetsuya; Kobayashi, Shoji; Komachi, Jun; Fukasawa, Masanaga; Kinoshita, Takashi; Ansai, Hisahiro
- Publisher
- Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
- Published
- 2011
- Language
- EN
- Field
- Engineering (Physical Sciences)