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About this Engineering article
Microstructure, oxidation and H2-permeation resistance of TiAlN films deposited by DC magnetron sputtering technique by B.Y. Man; L. Guzman; A. Miotello; M. Adami is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- B.Y. Man; L. Guzman; A. Miotello; M. Adami
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0257-8972)
- Published
- 2004
- Language
- EN
- Field
- Engineering (Physical Sciences)
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