About this Materials Science article
Application of Polysilanes to LSI Manufacturing ProcessesTheir Antireflective Properties and Etching Selectivity toward Resists by Hayase, S.; Nakano, Y.; Ohta, H.; Sato, Y.; Shiobara, E.; Miyoshi, S.; Onishi, Y.; Abe, M.; Matsuyama, H.; Ohiwa, Y. is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Hayase, S.; Nakano, Y.; Ohta, H.; Sato, Y.; Shiobara, E.; Miyoshi, S.; Onishi, Y.; Abe, M.; Matsuyama, H.; Ohiwa, Y.
- Publisher
- American Chemical Society; American Chemical Society (ACS) (ISSN 0897-4756)
- Published
- 2001
- Language
- EN
- Field
- Materials Science (Physical Sciences)