Opening book details…
About this Engineering article
Application of Extremely Thin ZrN Film as Diffusion Barrier between Cu and SiOC by Sato, Masaru; Takeyama, Mayumi B.; Aoyagi, Eiji; Noya, Atsushi is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Sato, Masaru; Takeyama, Mayumi B.; Aoyagi, Eiji; Noya, Atsushi
- Publisher
- Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
- Published
- 2008
- Field
- Engineering (Physical Sciences)
More by Sato, Masaru; Takeyama, Mayumi B.; Aoyagi, Eiji; Noya, Atsushi
Browse all works by Sato, Masaru; Takeyama, Mayumi B.; Aoyagi, Eiji; Noya, Atsushi