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About this Engineering article

High density and low leakage current based SRAM cell using 45 nm technology by Akashe, Shyam; Sharma, Sanjay is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author
Akashe, Shyam; Sharma, Sanjay
Publisher
Taylor and Francis Group; Informa UK (Taylor & Francis); Taylor & Francis; Informa UK Limited (ISSN 0020-7217)
Published
2013
Language
EN
Field
Engineering (Physical Sciences)