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About this Engineering article
Low-temperature preparation of ITO films by dual ion beam sputtering by Yoshifumi Suzaki; Tomokazu Shikama; Osamu Tanaka; Hiroshi Higuchi; Shigeaki Nakamura is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Yoshifumi Suzaki; Tomokazu Shikama; Osamu Tanaka; Hiroshi Higuchi; Shigeaki Nakamura
- Publisher
- John Wiley and Sons; Wiley (John Wiley & Sons); Scripta Technica; Wiley (ISSN 8756-663X)
- Published
- 1999
- Language
- EN
- Field
- Engineering (Physical Sciences)