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About this Engineering article
Energy Dependence of Ion-assisted Chemical Etch Rates in Reactive Plasmas by Stafford, L.; Margot, J.; Chaker, M.; Pearton, S. J. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Stafford, L.; Margot, J.; Chaker, M.; Pearton, S. J.
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 2005
- Field
- Engineering (Physical Sciences)
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