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About this Engineering article
Optimum design of n+-n-double-diffused drain MOSFET to reduce hot-carrier emission by Koyanagi, M.; Kaneko, H.; Shimizu, S. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Koyanagi, M.; Kaneko, H.; Shimizu, S.
- Publisher
- IEEE; Institute of Electrical and Electronics Engineers; Institute of Electrical and Electronics Engineers (IEEE) (ISSN 0018-9383)
- Published
- 1985
- Language
- EN
- Field
- Engineering (Physical Sciences)