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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Alternative Lithographic Technologies VI - Towards electrical testable SOI devices using Directed Self-Assembly for fin formation by Resnick, Douglas J.; Bencher, Christopher; Liu, Chi-Chun; Estrada-Raygoza, Cristina; He, Hong; Cicoria, Michael; Rastogi, Vinayak; Mohanty, Nihar; Tsai, Hsinyu; Schepis, Anthony; Lai, Kafai; Chao, Robin; Liu, Derrick; Guillorn, Michael; Cantone, Jason; Mignot, Sylvie; Kim, Ryoung-Han; Cheng, Joy; Tjio, Melia; Ko, Akiteru; Hetzer, David; Somervell, Mark; Colburn, Matthew is a scholarly article available to read on EtoBox.

Author
Resnick, Douglas J.; Bencher, Christopher; Liu, Chi-Chun; Estrada-Raygoza, Cristina; He, Hong; Cicoria, Michael; Rastogi, Vinayak; Mohanty, Nihar; Tsai, Hsinyu; Schepis, Anthony; Lai, Kafai; Chao, Robin; Liu, Derrick; Guillorn, Michael; Cantone, Jason; Mignot, Sylvie; Kim, Ryoung-Han; Cheng, Joy; Tjio, Melia; Ko, Akiteru; Hetzer, David; Somervell, Mark; Colburn, Matthew
Publisher
SPIE
Published
2014

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