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About this Engineering article
Effect of substrate bias and oxygen partial pressure on properties of RF magnetron sputtered HfO2 thin films by Maidul Haque, Sk.; Sagdeo, Pankaj R.; Balaji, Shanmugam; Sridhar, Kalavathi; Kumar, Sanjiv; Bhattacharyya, Debarati; Bhattacharyya, Dibyendu; Sahoo, Naba K. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Maidul Haque, Sk.; Sagdeo, Pankaj R.; Balaji, Shanmugam; Sridhar, Kalavathi; Kumar, Sanjiv; Bhattacharyya, Debarati; Bhattacharyya, Dibyendu; Sahoo, Naba K.
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics; AVS Science and Technology Society (ISSN 1520-8567)
- Published
- 2014
- Language
- EN
- Field
- Engineering (Physical Sciences)