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Semiconductor Manufacturing Handbook (McGraw-Hill Handbooks S) by Hwaiyu Geng; Lin Zhou; Ilsun Park; K. V Ravi; Hazara S Rathore; Kaushik Chanda; L. P Ren; King N Tu; David J Coumou; Peter Biltoft; Charles Howard; Chris A Mack; Michael Graf; Peng Zhang; Shouliang Lai; Florian Solzbacher; Edward J McInerney; Jamal Ramdani; Giovanni Vaccari; Tom Ritzdorf; John Klocke; Timothy S Dyer; Andrew Machamer; Donald W Blair; Kazuhisa Arai; Yoshikazu Kobayashi; Hideaki Otani; Dietrich Tönnies; Michael Töpper; Zhong L Wang; Michael A Huff; David N Liu; Wayne D Curcie; Joseph D Sweeney; James C Cox; Kristin Cavicchi; Dan Barsness; Charles K Gould; David J Albrecht; Bo Li; Wayne Carriker; Clint Haris; Ram Peltinov; Mina Menaker; Bruno Scibilia; Yoan Dupret Altis; Robert H McCafferty; Brett J Davis; Steven R Trammell; Richard V Pavlotsky is a nonfiction available to read on EtoBox.

What is Semiconductor Manufacturing Handbook (McGraw-Hill Handbooks S) about?

This handbook will provide engineers with the principles, applications, and solutions needed to design and manage semiconductor manufacturing operations. Consolidating the many complex fields of semiconductor fundamentals and manufacturing into one volume by deploying a team of world class specialists, it allows the quick look up of specific manufacturing reference data across many subdisciplines. Table of contents PART 1: Semiconductor Fundamentals and Basic MaterialsBOARD OF REVIEWERSCONTRIBUTORSPREFACEACKNOWLEDGMENTSChapter 1: How Semiconductor Chips Are Made - Hwaiyu Geng, Lin ZhouChapter 2: IC Design - Ilsun ParkChapter 3: Silicon Substrates for Semiconductor Manufacturing - K.V. RaviChapter 4: Copper, Low-k Dielectrics, and Their Reliability - Hazara S. Rathore, Kaushik ChandaChapter 5: Fundamentals-Silicide Formation on Si - L.P. Ren, King N. TuChapter 6: Plasma Process Control - David J. CoumouChapter 7: Vacuum Technology - Peter BiltoftChapter 8: Photomask - Charles HowardPART 2: Wafer ProcessingChapter 9: Microlithography - Chris A. MackChapter 10: Ion Implantation and Rapid Thermal Processing - Michael GrafChapter 11: Wet Etching - Peng ZhangChapter 12: Plasma Etching -

Who reads Semiconductor Manufacturing Handbook (McGraw-Hill Handbooks S)?

Author

Hwaiyu Geng; Lin Zhou; Ilsun Park; K. V Ravi; Hazara S Rathore; Kaushik Chanda; L. P Ren; King N Tu; David J Coumou; Peter Biltoft; Charles Howard; Chris A Mack; Michael Graf; Peng Zhang; Shouliang Lai; Florian Solzbacher; Edward J McInerney; Jamal Ramdani; Giovanni Vaccari; Tom Ritzdorf; John Klocke; Timothy S Dyer; Andrew Machamer; Donald W Blair; Kazuhisa Arai; Yoshikazu Kobayashi; Hideaki Otani; Dietrich Tönnies; Michael Töpper; Zhong L Wang; Michael A Huff; David N Liu; Wayne D Curcie; Joseph D Sweeney; James C Cox; Kristin Cavicchi; Dan Barsness; Charles K Gould; David J Albrecht; Bo Li; Wayne Carriker; Clint Haris; Ram Peltinov; Mina Menaker; Bruno Scibilia; Yoan Dupret Altis; Robert H McCafferty; Brett J Davis; Steven R Trammell; Richard V Pavlotsky

Publisher

McGraw-Hill Professional

Published

2005

Language

EN

ISBN

9780071468152

Category

nonfiction

Subjects

Engineering, Mathematics, Technology