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What is ALD of Aluminum Phosphate with TDMAP about?

This manuscript presents a study on the atomic layer deposition (ALD) of aluminum phosphate layers using tris(dimethylamino)phosphine (TDMAP) as a phosphorus precursor. The authors report on the characterization of the deposition process, revealing that films have a stoichiometry of Al1 P0.51 O2.9 and exhibit significant potential for applications in battery coating materials due to their phosphorus content.

Author

Ahmad Ali Pannu

Language

EN