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About this Engineering article
Silicon Oxynitride and Oxide-Nitride-Oxide Gate Dielectrics by Combined Plasma-Rapid Thermal Processing by Ma, Y.; Hattangady, S.V.; Yasuda, T.; Niimi, H.; Gandhi, S.; Lucovsky, G. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Ma, Y.; Hattangady, S.V.; Yasuda, T.; Niimi, H.; Gandhi, S.; Lucovsky, G.
- Publisher
- Cambridge University Press; Cambridge University Press (Materials Research Society); Cambridge University Press (CUP) (ISSN 0272-9172)
- Published
- 1994
- Field
- Engineering (Physical Sciences)
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