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About this Materials Science article
Deposition of SiO2 and TiO2 thin films by plasma enhanced chemical vapor deposition for antireflection coating by C. Martinet; V. Paillard; A. Gagnaire; J. Joseph is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- C. Martinet; V. Paillard; A. Gagnaire; J. Joseph
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0022-3093)
- Published
- 1997
- Field
- Materials Science (Physical Sciences)
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