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About this Materials Science article
Comparison of (CH4O2)bH2 and COH2 plasmas for low temperature diamond film deposition by electron cyclotron resonance plasma-assisted chemical vapor deposition by Eddy, C.R.; Youchison, D.L.; Sartwell, B.D. is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Eddy, C.R.; Youchison, D.L.; Sartwell, B.D.
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0925-9635)
- Published
- 1994
- Field
- Materials Science (Physical Sciences)
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