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About this Engineering article
The effect of topographical local charging on the etching of deep-submicron structures in SiO[sub 2] as a function of aspect ratio by Matsui, Jun; Nakano, Nobuhiko; Petrović, Zoran Lj.; Makabe, Toshiaki is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Matsui, Jun; Nakano, Nobuhiko; Petrović, Zoran Lj.; Makabe, Toshiaki
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 2001
- Language
- EN
- Field
- Engineering (Physical Sciences)
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