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Dimensional Crossover Induced Topological Hall Effect in a Magnetic Topological Insulator by Liu, Chang; Zang, Yunyi; Ruan, Wei; Gong, Yan; He, Ke; Ma, Xucun; Xue, Qi-Kun; Wang, Yayu is a scholarly article available to read on EtoBox.
What is Dimensional Crossover Induced Topological Hall Effect in a Magnetic Topological Insulator about?
We report transport studies of Mn-doped Bi2Te3 topological insulator (TI) films with accurately controlled thickness grown by molecular beam epitaxy. We find that films thicker than 5 quintuple-layer (QL) exhibit the usual anomalous Hall effect for magnetic TIs. When the thickness is reduced to 4 QL, however, characteristic features associated with the topological Hall effect (THE) emerge. More surprisingly, the THE vanishes again when the film thickness is further reduced to 3 QL. Theoretical calculations demonstrate that the coupling between the top and bottom surface states at the dimensional crossover regime stabilizes the magnetic skyrmion structure that is responsible for the THE.
- Author
- Liu, Chang; Zang, Yunyi; Ruan, Wei; Gong, Yan; He, Ke; Ma, Xucun; Xue, Qi-Kun; Wang, Yayu
- Published
- 2017
- Language
- EN