About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Improving optical measurement accuracy using multi-technique nested uncertainties by Silver, R. M.; Zhang, N. F.; Barnes, B. M.; Zhou, H.; Heckert, A.; Dixson, R.; Germer, T. A.; Bunday, B.; Allgair, John A.; Raymond, Christopher J. is a scholarly article available to read on EtoBox.

Author

Silver, R. M.; Zhang, N. F.; Barnes, B. M.; Zhou, H.; Heckert, A.; Dixson, R.; Germer, T. A.; Bunday, B.; Allgair, John A.; Raymond, Christopher J.

Publisher

SPIE

Published

2009

Language

EN