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About this Engineering article
Comparison of the Electrical Properties of Poly-Si/Hf-Silicate Gate Stacks Fabricated by ALD Employing BDMAS and TDMAS Precursors by Kamiyama, Satoshi; Miura, Takayoshi; Nara, Yasuo is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Kamiyama, Satoshi; Miura, Takayoshi; Nara, Yasuo
- Publisher
- The Electrochemical Society; Electrochemical Society, Inc. (ISSN 0013-4651)
- Published
- 2006
- Language
- EN
- Field
- Engineering (Physical Sciences)
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