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About this Engineering article
Study of nano-mechanical properties for thin porous films through instrumented indentation: SiO2 low dielectric constant films as an example by M. Herrmann; F. Richter; S.E. Schulz is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- M. Herrmann; F. Richter; S.E. Schulz
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0167-9317)
- Published
- 2008
- Language
- EN
- Field
- Engineering (Physical Sciences)