About this scholarly article

2011 16th International Solid-State Sensors, Actuators and Microsystems Conference - Isotropic etching of 111 SCS for wafer-scale manufacturing of perfectly hemispherical silicon molds by Fegely, Laura C.; Hutchison, David N.; Bhave, Sunil A. is a scholarly article available to read on EtoBox.

Author

Fegely, Laura C.; Hutchison, David N.; Bhave, Sunil A.

Publisher

IEEE

Published

2011

Language

EN