About this scholarly article

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Development of DUV resists for zero angle and angled implant applications by Fallon, Patricia; Cronin, Michael F.; Lachowski, Joseph; Valerio, Pasquale R.; Bachetti, Larry; Georger, Jr., Jacque H.; Mori, Mike; Tomes, David N.; Wynja, Kim; Houlihan, Francis M. is a scholarly article available to read on EtoBox.

Author

Fallon, Patricia; Cronin, Michael F.; Lachowski, Joseph; Valerio, Pasquale R.; Bachetti, Larry; Georger, Jr., Jacque H.; Mori, Mike; Tomes, David N.; Wynja, Kim; Houlihan, Francis M.

Publisher

SPIE

Published

2001