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About this Engineering article
Leakage Current Reduction of Chemical-Vapor-Deposited Ta2O5Films on Rugged Polycrystalline Silicon Electrode for Dynamic Random Access Memory Application by Lin, Mark; Chang, Chun-Yen; Huang, Tiao-Yuan; Shieh, Win-Yi is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Lin, Mark; Chang, Chun-Yen; Huang, Tiao-Yuan; Shieh, Win-Yi
- Publisher
- Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
- Published
- 1999
- Field
- Engineering (Physical Sciences)
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