About this Engineering article
Novel Si‐Containing Resist, SCMR, for EB Lithography by Yamashita, Yoshio is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Yamashita, Yoshio
- Publisher
- The Electrochemical Society; Electrochemical Society, Inc. (ISSN 0013-4651)
- Published
- 1990
- Field
- Engineering (Physical Sciences)