About this scholarly article

ChemInform Abstract: Low‐Temperature Growth of Polycrystalline Si and Ge Films by Redox Reactions of Si2H6 and GeF4. by Jun-ichi Hanna; Kousaku Shimizu is a scholarly article available to read on EtoBox.

Author

Jun-ichi Hanna; Kousaku Shimizu

Publisher

John Wiley and Sons; Wiley (John Wiley & Sons); Wiley (ISSN 0931-7597)

Published

2001