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About this Engineering article
Characterization of the electronic structure and thermal stability of HfO 2 /SiO 2 /Si gate dielectric stack by Duan, T. L.; Pan, L.; Zhang, Z.; Tok, E. S.; Pan, J. S. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Duan, T. L.; Pan, L.; Zhang, Z.; Tok, E. S.; Pan, J. S.
- Publisher
- John Wiley and Sons; Wiley (John Wiley & Sons); John Wiley & Sons Inc.; Wiley; Research Square (ISSN 0142-2421)
- Published
- 2017
- Language
- EN
- Field
- Engineering (Physical Sciences)
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