About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Simulation of secondary electron emission in helium ion microscope for overcut and undercut line-edge patterns by Yamanaka, Takuya; Allgair, John A.; Raymond, Christopher J.; Inai, Kensuke; Ohya, Kaoru; Ishitani, Tohru is a scholarly article available to read on EtoBox.

Author

Yamanaka, Takuya; Allgair, John A.; Raymond, Christopher J.; Inai, Kensuke; Ohya, Kaoru; Ishitani, Tohru

Publisher

SPIE

Published

2009

Language

EN