About this scholarly article

2008 IEEE International Conference on Integrated Circuit Design and Technology and Tutorial - Analysis of Si substrate damage induced by inductively coupled plasma reactor with various superposed bias frequencies by Nakakubo, Y.; Matsuda, A.; Kamei, M.; Ohta, H.; Eriguchi, K.; Ono, K. is a scholarly article available to read on EtoBox.

Author

Nakakubo, Y.; Matsuda, A.; Kamei, M.; Ohta, H.; Eriguchi, K.; Ono, K.

Publisher

IEEE

Published

2008

Language

EN