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About this Engineering article
Investigations on hydrogenated amorphous silicon films grown at high rate in a UHV plasma CVD system by P.N. Dixit; O.S. Panwar; B.S. Satyanarayan; R. Bhattacharyya is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- P.N. Dixit; O.S. Panwar; B.S. Satyanarayan; R. Bhattacharyya
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0927-0248)
- Published
- 1995
- Language
- EN
- Field
- Engineering (Physical Sciences)
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