Skip to content

Opening book details…

Can I read Tunable Sulfur Incorporation into Atomic Layer Deposition Films Using Solution Anion Exchange on EtoBox?

Tunable Sulfur Incorporation into Atomic Layer Deposition Films Using Solution Anion Exchange by Julia D. Lenef; Andrew J. Gayle; Jaesung Jo; Kalyn M. Fuelling; Srinivas K. Yadavalli; Alondra M. Ortiz-Ortiz; Kai Sun; Rebecca L. Peterson; Neil P. Dasgupta is a Materials Science article available to read on EtoBox.

What is Tunable Sulfur Incorporation into Atomic Layer Deposition Films Using Solution Anion Exchange about?

Metal sulfide and oxysulfide thin films deposited by atomic layer deposition (ALD) are important functional materials for a range of applications including solar cells, catalysts, and electronic devices. However, ALD of sulfurcontaining films typically requires H 2 S, a toxic, corrosive, and flammable gas. To circumvent these challenges, we propose a method of tuning sulfur incorporation into ALD films by first growing a metal oxide, using CuO x as a model system, followed by a solution-phase sulfur anion-exchange process. By controlling the reaction time, solution molarity, and temperature, we demonstrate tunable sulfur incorporation into the films, which is described using a coupled reaction-diffusion model. The evolution of the film crystallinity, composition, and morphology was quantified as a function of the anion-exchange process parameters. Conformal anion exchange on a ZnO@TiO 2 @CuO core−shell− shell nanowire is shown, demonstrating the ability to maintain the conformality of the initial ALD process on high-aspect-ratio structures. Additionally, area-selective anion exchange was performed on micro-patterned substrates, illustrating a pathway toward device fabrication. Fina

Who reads Tunable Sulfur Incorporation into Atomic Layer Deposition Films Using Solution Anion Exchange?

It is typically read by researchers, students, and practitioners in Materials Science.

Author
Julia D. Lenef; Andrew J. Gayle; Jaesung Jo; Kalyn M. Fuelling; Srinivas K. Yadavalli; Alondra M. Ortiz-Ortiz; Kai Sun; Rebecca L. Peterson; Neil P. Dasgupta
Publisher
American Chemical Society (ACS)
Published
2023
Language
EN
Field
Materials Science (Physical Sciences)

More by Julia D. Lenef; Andrew J. Gayle; Jaesung Jo; Kalyn M. Fuelling; Srinivas K. Yadavalli; Alondra M. Ortiz-Ortiz; Kai Sun; Rebecca L. Peterson; Neil P. Dasgupta

Browse all works by Julia D. Lenef; Andrew J. Gayle; Jaesung Jo; Kalyn M. Fuelling; Srinivas K. Yadavalli; Alondra M. Ortiz-Ortiz; Kai Sun; Rebecca L. Peterson; Neil P. Dasgupta