About this Engineering article
Low Temperature (150–250°C) Deposition of n+ and p+ Microcrystalline Silicon for VLSI Device Contacts by Rajeswaran, G.; Vanier, P. E.; Kampas, F. J.; Corderman, R. R. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Rajeswaran, G.; Vanier, P. E.; Kampas, F. J.; Corderman, R. R.
- Publisher
- Cambridge University Press; Cambridge University Press (Materials Research Society); Cambridge University Press (CUP) (ISSN 0272-9172)
- Published
- 1983
- Language
- EN
- Field
- Engineering (Physical Sciences)