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About this Engineering article
Density functional study on the adsorption and surface reactions on SiO2 in TiN-CVD using TiCl4 and NH3 by Tatsuo Tanaka; Tohru Nakajima; Koichi Yamashita is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Tatsuo Tanaka; Tohru Nakajima; Koichi Yamashita
- Publisher
- Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)
- Published
- 2002
- Language
- EN
- Field
- Engineering (Physical Sciences)
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