About this Materials Science article
Reduced Pressure–Chemical Vapour Deposition of Si/SiGe heterostructures for nanoelectronics by J.M. Hartmann; F. Andrieu; D. Lafond; T. Ernst; Y. Bogumilowicz; V. Delaye; O. Weber; D. Rouchon; A.M. Papon; N. Cherkashin is a Materials Science article available to read on EtoBox.
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- Author
- J.M. Hartmann; F. Andrieu; D. Lafond; T. Ernst; Y. Bogumilowicz; V. Delaye; O. Weber; D. Rouchon; A.M. Papon; N. Cherkashin
- Publisher
- Elsevier Science; Elsevier ; Elsevier Ltd; Elsevier BV (ISSN 0921-5107)
- Published
- 2008
- Language
- EN
- Field
- Materials Science (Physical Sciences)