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Can I read Absolute densities and kinetics of H atoms and CFx radicals in low-pressure, high-density CHF3 plasmas on EtoBox?
Absolute densities and kinetics of H atoms and CFx radicals in low-pressure, high-density CHF3 plasmas by K. Sasaki; M. Okamoto is a Engineering article available to read on EtoBox.
What is Absolute densities and kinetics of H atoms and CFx radicals in low-pressure, high-density CHF3 plasmas about?
Absolute densities of CF, CF 2 , and H in helicon-wave CHF 3 plasmas were measured by laser-induced fluorescence spectroscopy. It was found that the H atom density was higher than the CF and CF 2 radical densities. The radial distributions of the CF, CF 2 , and H densities had hollow shapes, namely, the densities in the plasma column were lower than those in the outside area. This result indicates that H and CF x are produced from hydrogenated fluorocarbon film deposited on the chamber wall. It was observed that the CF 2 density increased significantly in the afterglow, which was a direct evidence for surface production of CF 2 . In addition, the temporal variation of the H density also suggests surface production of H atoms in the afterglow.
Who reads Absolute densities and kinetics of H atoms and CFx radicals in low-pressure, high-density CHF3 plasmas?
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- K. Sasaki; M. Okamoto
- Publisher
- Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)
- Published
- 2006
- Language
- EN
- Field
- Engineering (Physical Sciences)