About this scholarly article

2011 IEEE International Conference on IC Design & Technology - Excellent silicon thickness uniformity on Ultra-Thin SOI for controlling Vt variation of FDSOI by Schwarzenbach, W.; Cauchy, X.; Boedt, F.; Bonnin, O.; Butaud, E.; Girard, C.; Nguyen, B.-Y.; Mazure, C.; Maleville, C. is a scholarly article available to read on EtoBox.

Author

Schwarzenbach, W.; Cauchy, X.; Boedt, F.; Bonnin, O.; Butaud, E.; Girard, C.; Nguyen, B.-Y.; Mazure, C.; Maleville, C.

Publisher

IEEE

Published

2011