About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Alternative Lithographic Technologies VIII - Chemoepitaxial guiding underlayers for density asymmetric and energetically asymmetric diblock copolymers by Bencher, Christopher; Cheng, Joy Y.; Nation, Benjamin D.; Ludovice, Peter J.; Henderson, Clifford L. is a scholarly article available to read on EtoBox.

Author

Bencher, Christopher; Cheng, Joy Y.; Nation, Benjamin D.; Ludovice, Peter J.; Henderson, Clifford L.

Publisher

SPIE

Published

2016