About this scholarly article

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - Ultra-low roughness magneto-rheological finishing for EUV mask substrates by Dumas, Paul; Jenkins, Richard; McFee, Chuck; Kadaksham, Arun J.; Balachandran, Dave K.; Teki, Ranganath; Faure, Thomas B.; Ackmann, Paul W. is a scholarly article available to read on EtoBox.

Author

Dumas, Paul; Jenkins, Richard; McFee, Chuck; Kadaksham, Arun J.; Balachandran, Dave K.; Teki, Ranganath; Faure, Thomas B.; Ackmann, Paul W.

Publisher

SPIE

Published

2013